Chemical Vapour Deposition

Plasma Enhanced Chemical Vapor Deposition unit, APT, Pune

Submitted by ajoy on Fri, 09/10/2010 - 16:01

Area Linked to:

Surface Engineering

Research Area:

Surface Chemistry

Advance Process Technology, Pune. Plasma CVD with substrate temperature 500oC , RF power 500 Watt, possibility of 3 precursor gases together.

Equipment Info

Resolution & Range:

Thin Film Coating

Applications:

For deposition of thin film by CVD process. Used in development of carbonitride thin films for wear and optical application

Model & Make:

Advance Process Technology, Pune

Equipment Code:

SEN/01

Year of Installation:

2004

PIR holder:

Dr. S.K. Mishra