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Plasma Enhanced Chemical Vapor Deposition unit, APT, Pune

Submitted by ajoy on Fri, 09/10/2010 - 16:01
Area Linked to: 
Surface Engineering
Research Area: 
Surface Chemistry

Advance Process Technology, Pune. Plasma CVD with substrate temperature 500oC , RF power 500 Watt, possibility of 3 precursor gases together.

Equipment Info
Resolution & Range: 
Thin Film Coating
Applications: 
For deposition of thin film by CVD process. Used in development of carbonitride thin films for wear and optical application
Model & Make: 
Advance Process Technology, Pune
Equipment Code: 
SEN/01
Year of Installation: 
2004
PIR holder: 
Dr. S.K. Mishra

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