High Resolution
High resolution and high temperature X-ray diffractometer
Submitted by ajoy on Thu, 08/19/2010 - 14:52The high resolution and high temperature X-ray diffractometer equipped with reflectometry at NML was installed in the year 2008. The main important feature of the system is its high resolution capabilities. Apart from the routine quality & quantitative phase analysis, the available software, TOPAS, can be used to determine micros strain and crystallite size. The reflectometry attachment along with the LEPTOS software can be used for the characterisation of thin films. The high temperature camera (upto 1600 degree C) with facilities to operate under controlled atmosphere and vacuum is used for high temperature phase transformation studies. The Euclerian Cradle available with the diffratometer gives it addition capability for crystallographic texture measurements.